An arc discharge ion source operating in an inhomogeneous magnetic field, the electrode system and the magnetic system are carefully arranged so that the plasma generated by the discharge has a two contraction (geometric pinch and magnetic pinch). Due to the large intensity of ion current, high brightness, and the main structure is compact, the use is very common.
High power dual plasma ion source can produce positive ion beam above the ampere level, which is an effective high current ion source. When the positive ions are neutralized, they are converted into neutral beams. The negative ion beam can be directly extracted from the double plasma ion source, and the positive ion beam can also be obtained.
Synthesis of dual plasma ion source and PIG ion source. High power dual source is a single charge state of the high current ion source, can lead to more than ampere level ion flow.
The small device is also used as a multi charged heavy ion source.
According to the configuration of the structure, a pair of cathode is added on the outer side of the anode of the double plasma ion source. But from the discharge principle, it has two kinds of ion source is very different. The first three electrodes form a system similar to a double plasma ion source. Due to the same or more negative voltage on the cathode and the intermediate electrode, the electron is reflected between the intermediate electrode and the cathode.
Negative ion source
Device for generating negative ions by using positive ion beam. A positive ion beam interacts with the surface of a solid material or can be converted into a negative ion beam by trapping electrons with a gas target. Positive ion beams can be supplied by a small double plasma ion source. If a high frequency ion source is used, as long as the channel of the extraction electrode is lengthened, the negative ion beam can be obtained.