无标题文档
Hello! Welcome to DongGuan Sinovation Electronics Technlogy Co.Ltd
Product
4INDUSTRY

Specification of plasma source


Ion beam intensity
The equivalent current strength of the useful ion beam, which is expressed in the current unit A or mA.
Useful ion percentage
The percentage of useful ion beams in the total ion beam. Generally speaking, the ion source gives a total ion beam including a single charge ion, a multi charged ion,
Ion beams of various molecular ions and impurity elements.
Energy dispersion
Due to thermal motion of ions and leads to the different locations, the ion source is given the energy of some discrete single energy requirements, generally want to scatter as small as possible, in the application of high precision ion beam especially.
The focusing performance of beam
The ion beam section and the said. The loss of ions will be lost when the ion beam is not focused. In order to overcome this obstacle, the final obstacle is to obtain the high energy of ions in order to overcome this obstacle.
The efficiency of the ion source
The proportion of working substances in the form of an ion beam to the total amount of work consumed.
The working life
Ion source once installed after the time of use.
DongGuan Sinovation Electronics Technlogy Co.Ltd Copyright 2017 Technical support:Website construction [Administration]
address:Room 603 ,ZhongXing building ,GuanTai Road , DongGuan City , GuangDong Province ,China